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KDF Electronic & Vacuum Services, Inc. was formed in 1986, with the aim of extending the useful life of batch sputtering systems originally produced by Materials Research Corporation. The aim was to provide continuous product improvements for Batch Inline products, and hence cost effective, high efficiency solutions to users of these systems.

In 1986 KDF started to produce batch sputter systems for Materials Research Corporation and subsequently, Tokyo Electron Limited. In February 1999, KDF acquired from Tokyo Electron Ltd. all rights to MRC Batch Inline Sputter and Etch System product lines, previously acquired by TEL from MRC. KDF now provides worldwide support for the 8000, 800, 200, 600, 900 series; BMC, Aries, RIE 51/61, MIE-710 / 720, Aries and BMC-600 products. The company is well positioned to support these products. KDF employs some of the original system design engineers and many of the manufacturing, sales and service personnel are factory trained by both TEL (MRC) and KDF. The KDF product line consistently continues to grow to meet customer requirements. At the heart of the product portfolio, is a re-engineered new batch system platform that incorporates a state-of-the-art graphical computer control unit, and intelligent peripheral components.

In 1998 KDF introduced the 744NT large area Inline Sputter System, and more recently the 844NT with a substrate area of 660 x 660mm for 300mm and Flat Panel production. [return]

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