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The Eclipse is an advanced
multi-metal sputtering production tool, capable of depositing high
quality VLSI film stacks. The system is configured with sputter
etch, and three independent UHV sputter chambers to support both
metal and reactive sputtering modes. The cathodes are high
performance rotating magnet DC magnetrons capable of producing very
uniform films. The system has an ergonomic wafer handler with field
proven robotics. A production work horse, the system delivers a
throughput performance up to 54 wafers per hour, and lower cost of
ownership than any similar tool. TFE specializes in sourcing,
remanufacturing, and the re-supply of these systems. System
refurbishment includes the following features: |