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| Kenotec has the design and engineering expertise to produce complete systems, sub-systems or specialist vacuum components for customer specific designs. Many different types of application specific designs have been produced to meet key customer requirements, ranging from simple fittings and more complex 3D sample manipulators, to UHV chambers, and complete systems including Reactive Ion Etching, CVD and Sputtering. The following are examples: | |
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R&D sputtering system An R&D sputtering system designed for industrial research centers. The system is equipped with a cylindrical UHV, load-locked chamber. The system can be configured with up to 4 cathodes and etching. The system can accept targets up to 8" diameter, and is controlled through a PLC driver. |
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Modular R&D sputtering system This modular R&D Sputtering system, is multi-chamber load-locked UHV system. It's flexible process capability can satisfy the requirements of research laboratory and educational institutes alike. The individual process chambers insures that there is absolutely no process cross talk between the separated targets |
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Gas sensor test system The system is used for testing and developing gas sensors. A volumetric gas mixture is prepared in a climatically-controlled UHV chamber and monitored via a series of mass flow controllers. Different full scale controllers are used to obtain the precision over the required mixture range. The desired humidity content is obtained by mixing dry and wet air at the required ratio. |
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